Growth and characterization of Ge1-xSnx alloys grown by magnetron sputter deposition



Document title: Growth and characterization of Ge1-xSnx alloys grown by magnetron sputter deposition
Journal: Superficies y vacío
Database: PERIÓDICA
System number: 000404986
ISSN: 1665-3521
Authors: 1
1
1
Institutions: 1Universidad Autónoma de San Luis Potosí, Instituto de Investigación en Comunicación Optica, San Luis Potosí. México
Year:
Season: Dic
Volumen: 16
Number: 4
Pages: 22-24
Country: México
Language: Inglés
Document type: Artículo
Approach: Analítico
English abstract Single phase Ge1-xSnx alloys have been grown on Ge(100) and GaAs(100) substrates using a R. F. Sputtering system. Using HRXRD on asymmetrical planes in plane and in growth lattice parameters are obtained. A residual strain due to the differences in the linear thermal expansion coefficient between the alloy and the substrates is observed
Disciplines: Física y astronomía,
Ingeniería
Keyword: Física de materia condensada,
Ingeniería de materiales,
Aleaciones,
Germanio,
Estaño,
Pulverización catódica,
Películas delgadas,
Semiconductores
Keyword: Physics and astronomy,
Engineering,
Condensed matter physics,
Materials engineering,
Alloys,
Germanium,
Tin,
Sputtering,
Thin films,
Semiconductors
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