Determination of recombination lifetime in MOS structures using a lineal voltage-sweep technique



Document title: Determination of recombination lifetime in MOS structures using a lineal voltage-sweep technique
Journal: Superficies y vacío
Database: PERIÓDICA
System number: 000404806
ISSN: 1665-3521
Authors: 1
1
2
Institutions: 1Instituto Nacional de Astrofísica, Optica y Electrónica, Puebla. México
2Benemérita Universidad Autónoma de Puebla, Centro de Investigaciones en Dispositivos Semiconductores, Puebla. México
Year:
Season: Jun
Volumen: 17
Number: 2
Pages: 29-31
Country: México
Language: Español
Document type: Artículo
Approach: Analítico
English abstract A lineal-voltage sweep technique for measurements of recombination lifetime in MOS structures is proposed. When a fast lineal – voltage ramp is applied to the gate of an MOS capacitor a non-equilibrium depletion layer is formed and electronhole generation start in the space charge region and in the bulk. At elevated temperature the quasi-neutral region generation dominates rather than the space charge region generation. Then the diffusion length, and consequently the recombination lifetime, can be determined. Experimental results are shown
Disciplines: Física y astronomía,
Ingeniería,
Química
Keyword: Física de materia condensada,
Ingeniería de materiales,
Fisicoquímica y química teórica,
Estructuras MOS,
Semiconductores,
Electroquímica
Keyword: Physics and astronomy,
Engineering,
Chemistry,
Condensed matter physics,
Physics,
Materials engineering,
Physical and theoretical chemistry,
MOS structures,
Semiconductors,
Electrochemistry
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