Charge trapping phenomenon in Al/SRO/Al on Si structure by lateral electrical stress



Document title: Charge trapping phenomenon in Al/SRO/Al on Si structure by lateral electrical stress
Journal: Superficies y vacío
Database: PERIÓDICA
System number: 000404987
ISSN: 1665-3521
Authors: 1
1
2
2
Institutions: 1Instituto Nacional de Astrofísica, Optica y Electrónica, Tonantzintla, Puebla. México
2Benemérita Universidad Autónoma de Puebla, Instituto de Ciencias, Puebla. México
Year:
Season: Dic
Volumen: 16
Number: 4
Pages: 25-29
Country: México
Language: Inglés
Document type: Artículo
Approach: Analítico
English abstract In this article, the observation of charge trapping effect of silicon rich oxide (SRO) layer in an Al/SRO/Al on Si structure by lateral electrical stress is reported. The density of trapped charges depends on the deposition and post-treatment conditions of the SRO layer. For the Al/SRO/Al structure grown on n-Si substrates, positive trapped charges were observed. A model is proposed to interpret the experimental results
Disciplines: Física y astronomía,
Ingeniería
Keyword: Física de materia condensada,
Ingeniería de materiales,
Ingeniería electrónica,
Estado sólido,
Transporte electrónico,
Semiconductores,
Dieléctricos,
Películas delgadas,
Silicio,
Nanocristales
Keyword: Physics and astronomy,
Engineering,
Condensed matter physics,
Electronic engineering,
Materials engineering,
Solid state,
Electronic transport,
Semiconductors,
Dielectrics,
Thin films,
Silicon,
Nanocrystals
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