| Revue: | Polimeros (Sao Carlos) |
| Base de datos: | PERIÓDICA |
| Número de sistema: | 000313949 |
| ISSN: | 1678-5169 |
| Autores: | Principe, Martha1 Martínez, Ricardo Ortiz, Pedro Rieumont, Jacques |
| Instituciones: | 1Universidad de La Habana, Facultad de Química, La Habana. Cuba |
| Año: | 2000 |
| Periodo: | Ene-Mar |
| Volumen: | 10 |
| Número: | 1 |
| Paginación: | 08-14 |
| País: | Brasil |
| Idioma: | Inglés |
| Tipo de documento: | Artículo |
| Enfoque: | Experimental, analítico |
| Resumen en inglés | Poly(furfuryl alcohol) with different amounts of oxymethylenic bridges was synthesized using trifluoroacetic and p-toluenesulfonic acid. All polymers displayed a tendency to retain acids. The isolated products containing traces of acid became insoluble in a few hours; while neutral material maintains their solubility for at least one month. Polymers stored in solution were stable according to their ¹H NMR spectra. Polymers cross-linked after being exposed to UV radiation. The product of the reaction of polymer with maleic anhydride is useful for preparing negative photoresists |
| Disciplinas: | Química |
| Palabras clave: | Química de polímeros, Alcohol furfurílico, Fotoprotección, Polimerización |
| Keyword: | Chemistry, Polymer chemistry, Furfuryl alcohol, Polymerization, Photoresistance |
| Texte intégral: | Texto completo (Ver HTML) |
