Revista: | Polimeros (Sao Carlos) |
Base de datos: | PERIÓDICA |
Número de sistema: | 000313949 |
ISSN: | 1678-5169 |
Autores: | Principe, Martha1 Martínez, Ricardo Ortiz, Pedro Rieumont, Jacques |
Instituciones: | 1Universidad de La Habana, Facultad de Química, La Habana. Cuba |
Año: | 2000 |
Periodo: | Ene-Mar |
Volumen: | 10 |
Número: | 1 |
Paginación: | 08-14 |
País: | Brasil |
Idioma: | Inglés |
Tipo de documento: | Artículo |
Enfoque: | Experimental, analítico |
Resumen en inglés | Poly(furfuryl alcohol) with different amounts of oxymethylenic bridges was synthesized using trifluoroacetic and p-toluenesulfonic acid. All polymers displayed a tendency to retain acids. The isolated products containing traces of acid became insoluble in a few hours; while neutral material maintains their solubility for at least one month. Polymers stored in solution were stable according to their ¹H NMR spectra. Polymers cross-linked after being exposed to UV radiation. The product of the reaction of polymer with maleic anhydride is useful for preparing negative photoresists |
Disciplinas: | Química |
Palabras clave: | Química de polímeros, Alcohol furfurílico, Fotoprotección, Polimerización |
Keyword: | Chemistry, Polymer chemistry, Furfuryl alcohol, Polymerization, Photoresistance |
Texto completo: | Texto completo (Ver HTML) |