Pentacene based thin film transistors with high-k dielectric Nd2O3 as a gate insulator



Título del documento: Pentacene based thin film transistors with high-k dielectric Nd2O3 as a gate insulator
Revue: Brazilian journal of physics
Base de datos: PERIÓDICA
Número de sistema: 000330203
ISSN: 0103-9733
Autores: 1
2
2
2
2
Instituciones: 1J B College, Thin Film Laboratory, Assam, Bharat. India
2Dibrugarh University, Assam, Bharat. India
Año:
Periodo: Sep
Volumen: 40
Número: 3
Paginación: 357-360
País: Brasil
Idioma: Inglés
Tipo de documento: Artículo
Enfoque: Analítico, descriptivo
Resumen en inglés We have investigated the pentacene based Organic Thin Film Transistors (OTFTs) with High-k Dielectric Nd2O3. Use of high dielectric constant (high-k) gate insulator Nd2O3 reduces the threshold voltage and sub threshold swing of the OTFTs. The calculated threshold voltage -2.2V and sub-threshold swing 1V/decade, current ON-OFF ratio is 1.7 × 104 and mobility is 0.13cm2/V.s. Pentacene film is deposited on Nd2O3 surface using two step deposition method. Deposited pentacene film is found poly crystalline in nature
Disciplinas: Química,
Física y astronomía,
Ingeniería
Palabras clave: Ingeniería electrónica,
Constante dieléctrica,
Pentaceno,
Transistores,
Voltaje,
Películas delgadas
Keyword: Chemistry,
Physics and astronomy,
Engineering,
Electronic engineering,
Dielectric constant,
Transistors,
Pentacene,
Thin films,
Voltage,
Insulators
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