New observation of single electron trapping effect in Si nanoclusters embedded in SRO layer



Document title: New observation of single electron trapping effect in Si nanoclusters embedded in SRO layer
Journal: Superficies y vacío
Database: PERIÓDICA
System number: 000404818
ISSN: 1665-3521
Authors: 1
1
2
2
Institutions: 1Instituto Nacional de Astrofísica, Optica y Electrónica, Departamento de Electrónica, Tonantzintla, Puebla. México
2Benemérita Universidad Autónoma de Puebla, Centro de Investigación en Dispositivos Semiconductores, Puebla. México
Year:
Season: Sep
Volumen: 17
Number: 3
Pages: 9-11
Country: México
Language: Inglés
Document type: Artículo
Approach: Analítico
English abstract I-V characteristics of Al/SRO/Si MOS devices were measured. Novel I-V curves, with extraordinary current peaks in both positive and negative bias, were observed. These current peaks are ascribed to the charging or discharging of the Si nanoclusters near the SRO/Si interface
Disciplines: Física y astronomía,
Ingeniería
Keyword: Física de materia condensada,
Ingeniería de materiales,
Ingeniería electrónica,
Silicio,
Estructuras MOS
Keyword: Physics and astronomy,
Engineering,
Condensed matter physics,
Electronic engineering,
Materials engineering,
Silicon,
MOS structures
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