| Journal: | Revista mexicana de física |
| Database: | PERIÓDICA |
| System number: | 000361541 |
| ISSN: | 0035-001X |
| Authors: | Tiznado, H1 Domínguez, D1 Cruz, W. de la1 Machorro, R1 Curiel, M1 Soto, G1 |
| Institutions: | 1Universidad Nacional Autónoma de México, Centro de Nanociencias y Nanotecnología, Ensenada, Baja California. México |
| Year: | 2012 |
| Season: | Dic |
| Volumen: | 58 |
| Number: | 6 |
| Pages: | 459-465 |
| Country: | México |
| Language: | Inglés |
| Document type: | Artículo |
| Approach: | Analítico, teórico |
| English abstract | We report on the development of a fully operational atomic layer deposition (ALD) system. This system is computer-controlled and can deposit multilayered systems without user intervention. We describe the design of manifold, reaction chamber and exhaust. Additionally we give some features of the automatization software and electronics. To evaluate the ALD performance we used as precursor trymethyl aluminum (TMA) and tetrakis (dimethylamino) titanium (TDMAT) to deposit Al2O3 and TiO2, respectively, in nanolaminated film structures. The thicknesses and composition of the films are precisely controlled, as determined by spectroscopic ellipsometry, and the nanolaminates have a sharp interface as indicated by Auger depth profile |
| Disciplines: | Física y astronomía, Ingeniería |
| Keyword: | Física de materia condensada, Ingeniería de instrumentos, Depósito por Capas Atómicas (ALD), Nanolaminados, Instrumentación, Automatización, Elipsometría |
| Keyword: | Physics and astronomy, Engineering, Condensed matter physics, Instrumentation engineering, Atomic Layer Deposition (ALD), Nanolaminates, Instrumentation, Automation, Ellipsometry |
| Full text: | Texto completo (Ver PDF) |
