TiO2 and Al2O3 ultra thin nanolaminates growth by ALD; instrument automation and films characterization
Título del documento: TiO2 and Al2O3 ultra thin nanolaminates growth by ALD; instrument automation and films characterization
Revista: Revista mexicana de física
Base de datos: PERIÓDICA
Número de sistema: 000361541
ISSN: 0035-001X
Autors: 1
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Institucions: 1Universidad Nacional Autónoma de México, Centro de Nanociencias y Nanotecnología, Ensenada, Baja California. México
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Període: Dic
Volum: 58
Número: 6
Paginació: 459-465
País: México
Idioma: Inglés
Tipo de documento: Artículo
Enfoque: Analítico, teórico
Resumen en inglés We report on the development of a fully operational atomic layer deposition (ALD) system. This system is computer-controlled and can deposit multilayered systems without user intervention. We describe the design of manifold, reaction chamber and exhaust. Additionally we give some features of the automatization software and electronics. To evaluate the ALD performance we used as precursor trymethyl aluminum (TMA) and tetrakis (dimethylamino) titanium (TDMAT) to deposit Al2O3 and TiO2, respectively, in nanolaminated film structures. The thicknesses and composition of the films are precisely controlled, as determined by spectroscopic ellipsometry, and the nanolaminates have a sharp interface as indicated by Auger depth profile
Disciplines Física y astronomía,
Ingeniería
Paraules clau: Física de materia condensada,
Ingeniería de instrumentos,
Depósito por Capas Atómicas (ALD),
Nanolaminados,
Instrumentación,
Automatización,
Elipsometría
Keyword: Physics and astronomy,
Engineering,
Condensed matter physics,
Instrumentation engineering,
Atomic Layer Deposition (ALD),
Nanolaminates,
Instrumentation,
Automation,
Ellipsometry
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