Thin-film transistors based on zinc oxide films by ultrasonic spray pyrolysis



Document title: Thin-film transistors based on zinc oxide films by ultrasonic spray pyrolysis
Journal: Revista mexicana de física
Database: PERIÓDICA
System number: 000381241
ISSN: 0035-001X
Authors: 1
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Institutions: 1Benemérita Universidad Autónoma de Puebla, Instituto de Ciencias, Puebla. México
2Instituto Nacional de Astrofísica, Optica y Electrónica, Departamento de Electrónica, Tonantzintla, Puebla. México
Year:
Season: Mar-Abr
Volumen: 61
Number: 2
Pages: 123-126
Country: México
Language: Inglés
Document type: Artículo
Approach: Analítico, teórico
English abstract The application of Zinc Oxide (ZnO) films by ultrasonic spray pyrolysis at 250, 300 and 450°C as active layer in thin-film Transistors (TFTs) is presented. The performance of the devices shows an unexpected behavior in function of the deposition temperature. The ZnO films were deposited from 0.2 M precursor solution of Zinc acetate in methanol, using air as carrier gas. 70nm-thick ZnO was deposited over 100 nm-thick aluminum electrodes patterned on 50 nm-thick thermally grown SiO2 on highly doped Si wafers. The highly doped Si wafer was used as the gate electrode. The ZnO TFTs at 250°C showed field-effect mobilities around of 0.05 cm2/Vs and threshold voltages of 8 V
Disciplines: Física y astronomía
Keyword: Física,
Películas delgadas,
Propiedades eléctricas,
Transistores
Keyword: Physics and astronomy,
Physics,
Thin films,
Electric properties,
Transistors
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