Investigation of process-induced contaminations in silicon wafer processing
Document title: Investigation of process-induced contaminations in silicon wafer processing
Journal: Revista mexicana de física
Database: PERIÓDICA
System number: 000002243
ISSN: 0035-001X
Authors: 1
Institutions: 1Instituto Nacional de Astrofísica, Optica y Electrónica, Tonantzintla, Puebla. México
2Benemérita Universidad Autónoma de Puebla, Instituto de Ciencias, Puebla. México
Year:
Season: Dic
Volumen: 39
Number: 6
Pages: 939-944
Country: México
Language: Inglés
Document type: Artículo
Approach: Analítico
Disciplines: Ingeniería,
Física y astronomía
Keyword: Ingeniería electrónica,
Física de materia condensada,
Obleas,
Recocido,
Litografía,
Contaminación,
Semiconductores,
Alta temperatura,
Circuitos integrados,
Grabado humedo-oxido
Keyword: Engineering,
Physics and astronomy,
Electronic engineering,
Condensed matter physics,
Wafers,
Annealing,
Lithography,
Contamination,
Semiconductors,
High temperature,
Wet oxide etching,
Integrated circuits
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