Electrical characterization of planarized a-SiGe:H Thin-film Transistors



Document title: Electrical characterization of planarized a-SiGe:H Thin-film Transistors
Journal: Revista mexicana de física
Database: PERIÓDICA
System number: 000363496
ISSN: 0035-001X
Authors: 1
1
1
Institutions: 1Instituto Nacional de Astrofísica, Optica y Electrónica, Departamento de Electrónica, Tonantzintla, Puebla. México
Year:
Season: Ene-Feb
Volumen: 59
Number: 1
Pages: 62-65
Country: México
Language: Inglés
Document type: Artículo
Approach: Analítico, teórico
English abstract In this work the electrical characterization of n-channel a-SiGe:H TFTs with planarized gate electrode is presented. The planarized a-SiGe:H TFTs were fabricated at 200°C on corning glass substrate. The devices exhibit a subthreshold slope of 0.56 V/Decade, an on/off-current ratio approximately of 106 and off-current approximately of 0.3 × 10-12 A. The results show an improvement of the electrical characteristics when are compared to those unplanarized devices fabricated at higher temperature. Moreover, the simulation of the device using a SPICE model is presented
Disciplines: Física y astronomía
Keyword: Física,
Películas delgadas,
Silicio amorfo hidrogenado,
Bajas temperaturas,
Modelo espin uno,
Spice
Keyword: Physics and astronomy,
Physics,
Thin films,
Hydrogenated amorphous silicon,
Low temperatures,
Spin-one model,
Spice
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