Effect of GaN substrate thickness on the optical field of InGaN laser diodes



Document title: Effect of GaN substrate thickness on the optical field of InGaN laser diodes
Journal: Revista mexicana de física
Database: PERIÓDICA
System number: 000426112
ISSN: 0035-001X
Authors: 1
2
Institutions: 1Universidad de Ciego de Avila, Facultad de Informática y Ciencias Exactas, Ciego de Avila. Cuba
2Universidad de La Habana, Facultad de Física, La Habana. Cuba
Year:
Season: May-Jun
Volumen: 64
Number: 3
Country: México
Language: Inglés
Document type: Artículo
Approach: Analítico, teórico
English abstract In this work the influence of GaN substrate thickness on the near and far-field patterns of InGaN lasers structures is numerically studied. In simulation a typical structure with an InGaN-MQW active region, GaN waveguide and AlxGa1−xN cladding layers is considered. A fluctuating behavior was obtained showing that for some values of the substrate thickness the near and far-field patterns can be optimized, while there are critical values that significantly reduce the confinement factor and widen the far field patterns. It is also shown that, replacing the n-GaN contact layer by a graded index (GRIN) AlxGa1−xN layer can help reduce the optical field leakage to substrate. Simulation results indicate that properly choosing the thickness of the substrate and using a GRIN n-AlxGa1−xN contact layer it is possible to improve both the confinement factor and far field patterns in nitride lasers
Disciplines: Física y astronomía
Keyword: Optica,
Fuga de campo óptico,
Simulación numérica,
Diodos láser InGaN,
Sustratos GaN
Keyword: Optics,
Optical field leakage,
Numerical simulation,
InGaN laser diodes,
GaN substrates
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