Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method
Document title: Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method
Journal: Ceramica (Sao Paulo)
Database: PERIÓDICA
System number: 000215416
ISSN: 0366-6913
Authors: 1




2
Institutions: 1Universidade Federal de Sao Carlos, Centro Multidisciplinar para o Desenvolvimento de Materiais Ceramicos, Sao Carlos, Sao Paulo. Brasil
2Universidade Federal da Paraiba, Departamento de Quimica, Joao Pessoa, Paraiba. Brasil
Year:
Season: Ene-Mar
Volumen: 48
Number: 305
Pages: 38-42
Country: Brasil
Language: Inglés
Document type: Artículo
Approach: Experimental, descriptivo
Disciplines: Ingeniería
Keyword: Ingeniería de materiales,
Dióxido de titanio,
Titania,
Deposición
Keyword: Engineering,
Materials engineering,
Titanium dioxide,
Deposition
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