Document title: Erbium in a-Si:H
Journal: Brazilian journal of physics
Database: PERIÓDICA
System number: 000158903
ISSN: 0103-9733
Authors: 1
Institutions: 1Universidade Estadual de Campinas, Instituto de Fisica "Gleb Wataghin", Campinas, Sao Paulo. Brasil
Year:
Season: Dic
Volumen: 29
Number: 4
Pages: 616-622
Country: Brasil
Language: Inglés
Document type: Artículo
Approach: Analítico
English abstract A review of the current status of research on Er 3+ doped hydrogenated amorphous silicon (a-Si:H) is presented. Er has been introduced in a-Si:H and a-SiOx:H by ion implantation, co-sputtering and PECVD. In all cases, the characteristic atomic-like intra-4f 4I13/2 ® 4I15/2 photoluminescence emission at ~ 1.54 µm is observed at room temperature. The Er 3+ luminescence probability is determined by the local neighborhood of the ions. Therefore, local probes like EXAFS and Mössbauer spectroscopy have yielded very important information. A discussion of excitation processes, electroluminescence, and electronic doping effects, is also presented
Disciplines: Física y astronomía
Keyword: Física de materia condensada,
Semiconductores,
Silicio,
Erbio,
Espectroscopía,
Electroluminiscencia,
Fotoluminiscencia
Keyword: Physics and astronomy,
Condensed matter physics,
Semiconductors,
Silicon,
Erbium,
Spectroscopy,
Electroluminescence,
Photoluminescence
Full text: Texto completo (Ver HTML)