Electron mobility study of hot-wall CVD GaN and InN nanowires



Document title: Electron mobility study of hot-wall CVD GaN and InN nanowires
Journal: Brazilian journal of physics
Database: PERIÓDICA
System number: 000310585
ISSN: 0103-9733
Authors: 1




Institutions: 1Yale University, Electrical Engineering Department, New Haven, Connecticut. Estados Unidos de América
Year:
Season: Sep
Volumen: 36
Number: 3B
Pages: 824-827
Country: Brasil
Language: Inglés
Document type: Artículo
Approach: Experimental
English abstract A review of the dependence of the electron mobility on the free carrier concentration for gallium nitride and indium nitride nanowires grown using hot-wall chemical vapour deposition is presented. Gallium nitride nanowires exhibit mobilities of 100 cm²/Vs to below 1 cm²/Vs for carrier concentrations of 10(19) to 10(20) cm- 3. Theoretical estimations and annealing experiments indicate that the nanowires are heavily compensated. Indium nitride nanowires also exhibit high carrier concentrations, of the order of 10(20) to 10(22) cm- 3. For both types of nanowires, mobility decreases with increasing carrier concentration, consistent with transport limited by impurity scattering
Disciplines: Física y astronomía
Keyword: Física de materia condensada,
Nitruro de galio,
Nitruro de indio,
Nanoalambres,
Transporte de electrones
Keyword: Physics and astronomy,
Condensed matter physics,
Gallium nitride,
Indium nitride,
Nanowires,
Electron transport
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