Cu4O3 thin films deposited by non-reactive rf-magnetron sputtering from a copper oxide target
Título del documento: Cu4O3 thin films deposited by non-reactive rf-magnetron sputtering from a copper oxide target
Revue: Revista mexicana de física
Base de datos: PERIÓDICA
Número de sistema: 000447214
ISSN: 0035-001X
Autores: 1
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2
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4
Instituciones: 1Universidad Autónoma del Estado de México, Facultad de Química, Toluca. Estado de México. México
2Tecnológico de Estudios Superiores de Jocotitlán, Jocotitlán, Estado de México. México
3Universidad Nacional Autónoma de México, Instituto de Ciencias Aplicadas y Tecnología, Ciudad de México. México
4Universidad Juárez Autónoma de Tabasco, Jalpa de Méndez, Tabasco. México
Año:
Periodo: May-Jun
Volumen: 67
Número: 3
Paginación: 495-499
País: México
Idioma: Inglés
Tipo de documento: Artículo
Enfoque: Analítico, teórico
Resumen en inglés Copper oxide thin films deposited by sputtering are frequently formed by using metal copper targets in reactive atmospheres. In this report, paramelaconite (Cu4O3) thin films were deposited by non-reactive rf magnetron sputtering. The target used for sputtering was a copper oxide disk fabricated by oxidation of metal copper at 1000oC for 24 h in the air atmosphere. X-ray diffraction (XRD) results showed that the copper oxide target was mainly composed of cupric oxide (CuO) and cuprous oxide (Cu2O) crystals. Raman analyses suggested that the surface of the copper oxide disk is composed of a (CuO) layer. XRD measurements performed to the copper oxide thin films deposited by non-reactive rf magnetron sputtering showed that the film is composed of (Cu4O3) crystals. However, Raman measurements indicated that the thin films are also composed of amorphous CuO and Cu2O
Disciplinas: Física y astronomía
Palabras clave: Física,
Paramelaconita,
Cu403,
Pulverización catódica,
Oxidación térmica
Keyword: Physics,
Paramelaconite,
Cu4O3,
Sputtering,
Thermal oxidation
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