Ferroelectric thin films using oxides as raw materials



Título del documento: Ferroelectric thin films using oxides as raw materials
Revue: Materials research
Base de datos: PERIÓDICA
Número de sistema: 000312413
ISSN: 1516-1439
Autores: 1
Instituciones: 1Universidade Federal de Sao Carlos, Departamento de Fisica, Sao Carlos, Sao Paulo. Brasil
Año:
Periodo: Ene
Volumen: 2
Número: 1
Paginación: 17-21
País: Brasil
Idioma: Inglés
Tipo de documento: Artículo
Enfoque: Experimental
Resumen en inglés This work describes an alternative method for the preparation of ferroelectric thin films based on pre-calcination of oxides, to be used as precursor material for a solution preparation. In order to show the viability of the proposed method, PbZr0.53Ti0.47O3 and Bi4Ti3O12 thin films were prepared on fused quartz and Si substrates. The results were analyzed by X-ray Diffraction (XRD), Scanning Electron Microscopy (SEM), Infrared Spectroscopy (IR) and Rutherford Backscattering Spectroscopy (RBS). The films obtained show good quality, homogeneity and the desired stoichiometry. The estimated thickness for one layer deposition was approximately 1000 Å and 1500 Å for Bi4Ti3O12 and PbZr0.53Ti0.47O3 films, respectively
Disciplinas: Ingeniería
Palabras clave: Ingeniería de materiales,
Ingeniería eléctrica,
Películas delgadas,
Ferroelectricidad,
Control de calidad,
Titanato,
Bismuto
Keyword: Engineering,
Electrical engineering,
Materials engineering,
Thin films,
Ferroelectricity,
Quality control,
Titanate,
Bismuth
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