Effect of the deposition conditions of platinum electrodes on their performance as resistive heating elements
Document title: Effect of the deposition conditions of platinum electrodes on their performance as resistive heating elements
Journal: Materials research
Database: PERIÓDICA
System number: 000312760
ISSN: 1516-1439
Authors: 1


2
Institutions: 1Instituto de Engenharia de Sistemas e Computadores do Porto, Porto. Portugal
2Universidade de Tras-os-Montes e Alto Douro, Departamento de Fisica, Vila Real. Portugal
Year:
Season: Jul-Sep
Volumen: 7
Number: 3
Pages: 427-430
Country: Brasil
Language: Inglés
Document type: Nota breve o noticia
Approach: Experimental
English abstract The performance of different platinum electrodes used as resistive heating elements was studied. Pt films having different thickness were deposited by RF magnetron sputtering at room temperature followed by post-deposition annealing at 700 ºC or made in-situ at 700 ºC. The Pt films were deposited over oxidized silicon, using Ti or Zr buffer layers. The resistance dependence on temperature was studied by applying increasing currents (up to 2A) to the Pt films. Changes in the microstructure of the Pt films account for the changes in the temperature coefficient of resistance as a function of the deposition parameters. The maximum substrate temperature (675 ºC) was obtained when using 200 nm Pt films deposited at 700 ºC over Ti, with a power consumption of only 16 W
Disciplines: Ingeniería,
Física y astronomía
Keyword: Ingeniería de materiales,
Ingeniería mecánica,
Termodinámica y física estadística,
Películas delgadas,
Electrodos,
Platino,
Propiedades mecánicas,
Resistencia,
Tratamiento térmico
Keyword: Engineering,
Physics and astronomy,
Materials engineering,
Mechanical engineering,
Thermodynamics and statistical physics,
Thin films,
Electrodes,
Platinum,
Mechanical properties,
Resistance,
Thermal treatment
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