Influence of the growth parameters on TiO2 thin films deposited using the MOCVD method
Document title: Influence of the growth parameters on TiO2 thin films deposited using the MOCVD method
Journal: Ceramica (Sao Paulo)
Database: PERIÓDICA
System number: 000217560
ISSN: 0366-6913
Authors: 1




2
Institutions: 1Universidade Federal de Sao Carlos, Centro Multidisciplinar para o Desenvolvimento de Materiais Ceramicos, Sao Carlos, Sao Paulo. Brasil
2Universidade Federal da Paraiba, Departamento de Quimica, Joao Pessoa, Paraiba. Brasil
Year:
Season: Oct-Dic
Volumen: 48
Number: 308
Pages: 192-198
Country: Brasil
Language: Inglés
Document type: Artículo
Approach: Experimental, descriptivo
Disciplines: Ingeniería
Keyword: Ingeniería de materiales,
Ingeniería química,
Titania,
Caracterización,
Soporte,
Catálisis,
Dióxido de titanio
Keyword: Engineering,
Chemical engineering,
Materials engineering,
Titania,
Characterization,
Support,
Catalysts,
Titanium dioxide
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