The carbon incorporation in PECVD a-Si1-xCx:H in the low power density regime
Document title: The carbon incorporation in PECVD a-Si1-xCx:H in the low power density regime
Journal: Brazilian journal of physics
Database: PERIÓDICA
System number: 000134438
ISSN: 0103-9733
Authors: 1
Institutions: 1Universidade de Sao Paulo, Esc. Politecnica, Lab. Microelectronica, Sao Paulo. Brasil
2Universidade de Sao Paulo, Instituto de Física, Sao Paulo. Brasil
Year:
Season: Dic
Volumen: 27A
Number: 4
Pages: 150-153
Country: Brasil
Language: Inglés
Document type: Artículo
Approach: Analítico
Disciplines: Física y astronomía
Keyword: Física de materia condensada,
Semiconductores,
Películas delgadas,
Depósito químico de vapor,
Espectrometría
Keyword: Physics and astronomy,
Condensed matter physics,
Semiconductors,
Thin films,
Chemical vapor deposition,
Spectrometry
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