On the influence of deposition temperature on the microvoid structure and hydrogenation of A-G: H Films
Document title: On the influence of deposition temperature on the microvoid structure and hydrogenation of A-G: H Films
Journal: Brazilian journal of physics
Database: PERIÓDICA
System number: 000007969
ISSN: 0103-9733
Authors: 1
Institutions: 1Universidade Estadual de Campinas, Instituto de Fisica "Gleb Wataghin", Campinas, Sao Paulo. Brasil
Year:
Season: Mar
Volumen: 24
Number: 1
Pages: 420-424
Country: Brasil
Language: Inglés
Document type: Artículo
Approach: Analítico
Disciplines: Física y astronomía
Keyword: Física de materia condensada,
Rayos X,
Películas,
Deposición,
Dispersión,
Temperatura,
Microvacio-estructura
Keyword: Physics and astronomy,
Condensed matter physics,
Films,
X-rays,
Deposition,
Scattering,
Temperature,
Microvoid structure
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