Dependence of exchange bias in NiFe/NiO bilayers on film thickness



Título del documento: Dependence of exchange bias in NiFe/NiO bilayers on film thickness
Revista: Revista mexicana de física
Base de datos: PERIÓDICA
Número de sistema: 000425830
ISSN: 0035-001X
Autores: 1
Instituciones: 1Universidad del Zulia, Facultad de Ciencias, Maracaibo, Zulia. Venezuela
Año:
Periodo: Mar-Abr
Volumen: 63
Número: 2
País: México
Idioma: Inglés
Tipo de documento: Artículo
Enfoque: Analítico, teórico
Resumen en inglés Here we report on the effect of the ferromagnetic (FM) and antiferromagnetic (AF) films thicknesses on the exchange bias field in a FM/AF bilayer. For this, a series of NiFe(t NiFe)/NiO(t NiO) bilayers were grown by DC magnetron sputtering onto commercial Si(001) wafers. Magneto-optical hysteresis loops were used as probes to measure the exchange-bias field, and the coercivity field, as functions of the in-plane angle, φ H, and the films’ thicknesses, t NiFe and t NiO. The in-plane symmetry of the exchange field and coercivity display unidirectional and uniaxial anisotropies, with angular dependences different from the simple c o s φ H and c o s 2 φ H, respectively. These symmetries are intrinsically sensitive to the thickness of both NiFe and NiO layers. With respect to the FM layer thickness, the exchange bias and coercivity field follow the usual 1/t NiFe, while the dependence on the thickness of the AF layer is more complicated, and is characterized by a critical behavior
Disciplinas: Física y astronomía
Palabras clave: Física,
Sesgo de cambio,
Anisotropía unidireccional,
Bicapas Nife/NiO,
Materiales magnéticos de polarización,
Simetría de sesgo de intercambio
Keyword: Exchange-bias,
Unidirectional anisotropy,
NiFe/NiO bilayers,
Magnetic biasing materials,
Exchange bias symmetry
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