| Revista: | Superficies y vacío |
| Base de datos: | PERIÓDICA |
| Número de sistema: | 000395298 |
| ISSN: | 1665-3521 |
| Autores: | Díaz Guillén, J.C1 Garza Gómez, A1 Campa Castilla, A1 Méndez Méndez, R1 López Callejas, R2 Muñoz Castro, A.E2 Granda Gutiérrez, E.E3 |
| Instituciones: | 1Corporación Mexicana de Investigación en Materiales S.A. de C.V., Saltillo, Coahuila. México 2Instituto Nacional de Investigaciones Nucleares, México, Distrito Federal. México 3Instituto Tecnológico de Toluca, Toluca, Estado de México. México |
| Año: | 2007 |
| Periodo: | Dic |
| Volumen: | 20 |
| Número: | 4 |
| Paginación: | 1-3 |
| País: | México |
| Idioma: | Inglés |
| Tipo de documento: | Artículo |
| Enfoque: | Experimental |
| Resumen en inglés | This study reports the surface modification of AISI 304 stainless steel by applying nitrogen ion implantation by low energy plasma at different temperatures (380°C, 400°C, 440°C). The temperature of the samples was adjusted by varying the implantation pulse width while keeping the voltage constant at 1.5 kV. Microstructure and phase characterization were carried out by scanning electronic microscopy (SEM) and X-ray diffractometry (XRD) respectively. The surface hardness was determined by Knoop measurements, and the results show that the treatment increases up to two times the substrate hardness value. Additionally, it was found a direct dependence between the substrate temperature and the nitrided layer thickness. X-ray diffraction patterns indicate the shift of the peaks of the treated samples to lower angles than those of the untreated samples, which is a clear signature of expanded austenite |
| Disciplinas: | Física y astronomía, Ingeniería |
| Palabras clave: | Física, Ingeniería de materiales, Plasma, Modificación de superficies, Acero inoxidable, Implantación de iones, Nitruración, Estado sólido, Películas delgadas, Difracción de rayos X |
| Keyword: | Physics and astronomy, Engineering, Physics, Materials engineering, Plasma, Surface modification, Stainless steel, Ion implantation, Nitriding, Solid state, Thin films, X-ray diffraction |
| Texto completo: | Texto completo (Ver PDF) |
