| Revista: | Superficies y vacío |
| Base de datos: | PERIÓDICA |
| Número de sistema: | 000377928 |
| ISSN: | 1665-3521 |
| Autores: | Camacho López, M. A1 Galeana Camacho, J. R1 Esparza García, A2 Sánchez Pérez, C2 Julien, C. M3 |
| Instituciones: | 1Universidad Autónoma del Estado de México, Facultad de Química, Toluca, Estado de México. México 2Universidad Nacional Autónoma de México, Centro de Ciencias Aplicadas y Desarrollo Tecnológico, México, Distrito Federal. México 3Universite Pierre et Marie Curie, París. Francia |
| Año: | 2013 |
| Periodo: | Sep |
| Volumen: | 26 |
| Número: | 3 |
| Paginación: | 95-99 |
| País: | México |
| Idioma: | Inglés |
| Tipo de documento: | Artículo |
| Enfoque: | Experimental, aplicado |
| Resumen en inglés | Nanostructured tin oxide thin films were deposited on silicon and glass slides substrates by reactive DC-Magnetron sputtering using a tin target in a mixture of argon and oxygen gases. The substrate temperature was varied in the range from 53 to 243 oC, keeping the other deposition parameters constant. The tin oxide films were characterized by: Scanning Electron Microscopy, Energy Dispersive Spectrometry, X Ray Diffraction, microRaman spectroscopy and UV-VIS spectroscopy. It was found that the substrate temperature has an effect mainly on the structural, morphological and optical properties of the thin films. At 53 and 90 oC the tetragonal crystalline phase was obtained while a mixture of crystalline phases (o-SnO2 and t-SnO2) was obtained at 148, 185 and 243 oC |
| Disciplinas: | Ingeniería |
| Palabras clave: | Ingeniería de materiales, Películas delgadas, Oxido de estaño, Espectroscopía Raman, Pulverización catódica |
| Keyword: | Engineering, Materials engineering, Thin films, Tin oxide, Raman spectroscopy, Magnetron sputtering |
| Texto completo: | Texto completo (Ver HTML) |
