| Revista: | Superficies y vacío |
| Base de datos: | PERIÓDICA |
| Número de sistema: | 000368085 |
| ISSN: | 1665-3521 |
| Autores: | Ortiz Alvarado, Juan de Dios1 Huerta Ruelas, Jorge A1 |
| Instituciones: | 1Instituto Politécnico Nacional, Centro de Investigación en Ciencia Aplicada y Tecnología Avanzada, Querétaro. México |
| Año: | 2010 |
| Periodo: | Jun |
| Volumen: | 23 |
| Número: | 2 |
| Paginación: | 6-13 |
| País: | México |
| Idioma: | Inglés |
| Tipo de documento: | Artículo |
| Enfoque: | Experimental, aplicado |
| Resumen en inglés | An experimental study of masking effect on laser light scattering from machined surfaces is described. The results indicate that asperity distribution on rough surfaces is an implied factor on masking effect in addition to roughness and RMS slope. The masking effect was monitored on light scattering from isotropic and unidirectional rough surfaces. The masking effect characterized in isotropic rough surfaces agrees with the shadowing–masking function defined by B.G. Smith [IEEE Trans. Ant. and Prop. 15 668 (1967)]. We propose a new expression defined to describe masking effect on light scattering from unidirectional machined surfaces. This function was verified by comparing with experimental data. The results and the function proposed, are useful in implementing laser light scattering instruments for on–line monitoring of surface processes which produce unidirectional surface patterns (such as turning, milling, grinding, and some cases of extrusion, lithography and thin film growth), where geometrical setup requires large incidence angle |
| Disciplinas: | Ingeniería, Física y astronomía |
| Palabras clave: | Ingeniería de materiales, Optica, Dispersión de láser, Rugosidad superficial, Enmascaramiento |
| Keyword: | Engineering, Physics and astronomy, Materials engineering, Optics, Laser scattering, Surface roughness, Masking |
| Texto completo: | Texto completo (Ver HTML) |
