| Revista: | Materials research |
| Base de datos: | PERIÓDICA |
| Número de sistema: | 000312912 |
| ISSN: | 1516-1439 |
| Autores: | Silva, Maria Margareth da1 Ueda, Mario2 Otani, Choyu3 Reuther, Helfried4 Lepienski, Carlos Mauricio5 Soares-Junior, Paulo Cesar Otubo, Jorge |
| Instituciones: | 1Instituto Tecnologico de Aeronautica, Divisao de Engenharia Mecanica-Aeronautica, Sao Jose dos Campos, Sao Paulo. Brasil 2Instituto Nacional de Pesquisas Espaciais, Laboratorio Associado de Plasma, Sao Jose dos Campos, Sao Paulo. Brasil 3Instituto Tecnologico de Aeronautica, Departamento de Fisica, Sao Jose dos Campos, Sao Paulo. Brasil 4Institute of Ion Beam Physics and Materials Research, Dresden, Sajonia. Alemania 5Universidade Federal do Parana, Departamento de Fisica, Curitiba, Parana. Brasil |
| Año: | 2006 |
| Periodo: | Ene-Mar |
| Volumen: | 9 |
| Número: | 1 |
| Paginación: | 97-100 |
| País: | Brasil |
| Idioma: | Inglés |
| Tipo de documento: | Nota breve o noticia |
| Enfoque: | Experimental |
| Resumen en inglés | Based on the fact that the Ti-6Al-4V alloy has good mechanical properties, excellent resistance to corrosion and also excellent biocompatibility, however with low wear resistance, this work aims to test plasma processes or combination of plasma and ion implantation processes to improve these characteristics. Two types of processing were used: two steps PIII (Plasma Immersion Ion Implantation) combined with PN (Plasma Nitriding) and single step PIII treatment. According to Auger Electron Spectroscopy (AES) results, the best solution was obtained by PIII for 150 minutes resulting in ~ 65 nm of nitrogen implanted layer, while the sample treated with PIII (75 minutes) and PN (75 minutes) reached ~ 35 nm implanted layer. The improvement of surface properties could also be confirmed by the nanoindentation technique, with values of hardness increasing for both processes. AFM (Atomic Force Microscopy) characterization showed that the single step PIII process presented greater efficiency than the duplex process (PIII + PN), probably due to the sputtering occurring during the second step (PN) removing partially the implanted layer of first step (PIII) |
| Disciplinas: | Ingeniería |
| Palabras clave: | Ingeniería de materiales, Ingeniería metalúrgica, Aleaciones, Propiedades mecánicas, Nitridación de plasma, Resistencia, Corrosión |
| Keyword: | Engineering, Materials engineering, Metallurgical engineering, Alloys, Mechanical properties, Plasma nitriding, Resistance, Corrosion |
| Texto completo: | Texto completo (Ver HTML) |
