| Revista: | Brazilian journal of physics |
| Base de datos: | PERIÓDICA |
| Número de sistema: | 000336875 |
| ISSN: | 0103-9733 |
| Autores: | Abdelrahman, M.M1 |
| Instituciones: | 1Atomic Energy Authority, Nuclear Research Center, El Cairo. Egipto |
| Año: | 2010 |
| Periodo: | Mar |
| Volumen: | 40 |
| Número: | 1 |
| Paginación: | 26-29 |
| País: | Brasil |
| Idioma: | Inglés |
| Tipo de documento: | Artículo |
| Enfoque: | Analítico, descriptivo |
| Resumen en inglés | In this work, sputtering yield in a glow discharge ion source system has been determined using the operating parameters of the ion source. The sputtering yield is found to be varied between 0.4 to 1 atoms removed per incident ion for nitrogen while for argon between 0.2 to 1.3 atoms removed per incident ion. The feature of this ion source is high output ion beam current and small size. Operation of the ion source is quite simple since a stable discharge can be obtained within a large range of main parameters such as, discharge voltage, discharge current and gas pressure. Also, beam profile for argon ion beam produced from the glow discharge ion source at Id = 2,3 mA (discharge current) using argon gas with different gas pressures has been investigated |
| Disciplinas: | Física y astronomía |
| Palabras clave: | Física, Descarga de calor, Fuentes de iones, Argón, Plasma |
| Keyword: | Physics and astronomy, Physics, Glow discharge, Ion sources, Argon, Plasma |
| Texto completo: | Texto completo (Ver PDF) |
