Revista: | Brazilian journal of physics |
Base de datos: | PERIÓDICA |
Número de sistema: | 000159241 |
ISSN: | 0103-9733 |
Autores: | Piamonteze, Cinthia1 Tessler, Leandro R Alves, Martins M.C Tolentino, H |
Instituciones: | 1Universidade Estadual de Campinas, Instituto de Fisica "Gleb Wataghin", Campinas, Sao Paulo. Brasil 2Laboratorio Nacional de Luz Sincrotron, Campinas, Sao Paulo. Brasil |
Año: | 1999 |
Periodo: | Dic |
Volumen: | 29 |
Número: | 4 |
Paginación: | 756-759 |
País: | Brasil |
Idioma: | Inglés |
Tipo de documento: | Artículo |
Enfoque: | Analítico |
Resumen en inglés | We report a comparative Extended X-Ray Fine Structure (EXAFS) study of Er in a-Si:H prepared by Er implantation in a-Si:H and by co-sputtering undergoing the same cumulative annealing processes. It was found that the Er environment in as-implanted samples is formed by Si atoms, which are replaced by oxygen under annealing. In the co-sputtered samples, the initial low coordination oxygen environment evolves under thermal treatment to an Er2O3 -like neighborhood |
Disciplinas: | Física y astronomía |
Palabras clave: | Física de materia condensada, Optica, Semiconductores, Luminiscencia, Rayos X, Estructura fina, Silicio, Erbio |
Keyword: | Physics and astronomy, Condensed matter physics, Optics, Semiconductors, Luminescence, X-rays, Fine structure, Silicon, Erbium |
Texto completo: | Texto completo (Ver HTML) |