Environment of Er in a-Si:H: co-sputtering versus ion implantation



Título del documento: Environment of Er in a-Si:H: co-sputtering versus ion implantation
Revista: Brazilian journal of physics
Base de datos: PERIÓDICA
Número de sistema: 000159241
ISSN: 0103-9733
Autores: 1


Instituciones: 1Universidade Estadual de Campinas, Instituto de Fisica "Gleb Wataghin", Campinas, Sao Paulo. Brasil
2Laboratorio Nacional de Luz Sincrotron, Campinas, Sao Paulo. Brasil
Año:
Periodo: Dic
Volumen: 29
Número: 4
Paginación: 756-759
País: Brasil
Idioma: Inglés
Tipo de documento: Artículo
Enfoque: Analítico
Resumen en inglés We report a comparative Extended X-Ray Fine Structure (EXAFS) study of Er in a-Si:H prepared by Er implantation in a-Si:H and by co-sputtering undergoing the same cumulative annealing processes. It was found that the Er environment in as-implanted samples is formed by Si atoms, which are replaced by oxygen under annealing. In the co-sputtered samples, the initial low coordination oxygen environment evolves under thermal treatment to an Er2O3 -like neighborhood
Disciplinas: Física y astronomía
Palabras clave: Física de materia condensada,
Optica,
Semiconductores,
Luminiscencia,
Rayos X,
Estructura fina,
Silicio,
Erbio
Keyword: Physics and astronomy,
Condensed matter physics,
Optics,
Semiconductors,
Luminescence,
X-rays,
Fine structure,
Silicon,
Erbium
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