GaN nanowires and nanotubes growth by chemical vapor deposition method at different NH3 flow rate



Título del documento: GaN nanowires and nanotubes growth by chemical vapor deposition method at different NH3 flow rate
Revista: Revista mexicana de física
Base de datos: PERIÓDICA
Número de sistema: 000404276
ISSN: 0035-001X
Autores: 1
1
1
Instituciones: 1Wuhan University, School of Physics and Technology, Wuhan, Hubei. China
Año:
Periodo: May-Jun
Volumen: 62
Número: 3
Paginación: 219-222
País: México
Idioma: Inglés
Tipo de documento: Artículo
Enfoque: Analítico, teórico
Resumen en inglés GaN nanowires and nanotubes have been successfully synthesized via the simple chemical vapor deposition method. NH3 flow rate was found to be a crucial factor in the synthesis of different type of GaN which affects the shape and the diameter of generated GaN nanostructures. X-ray diffraction confirms that GaN nanowires grown on Si(111) substrate under 900◦C and with NH3 flow rate of 50 sccm presents the preferred orientation growth in the (002) direction. It is beneficial to the growth of nanostructure through catalyst annealing. Transmission electron microscopy and scanning electron microscopy were used to measure the size and structures of the samples
Disciplinas: Física y astronomía,
Ingeniería
Palabras clave: Física de materia condensada,
Ingeniería de materiales,
GaN,
CVD,
Nanotubos,
Tem
Keyword: Physics and astronomy,
Engineering,
Condensed matter physics,
Materials engineering,
GaN,
CVD,
Nanotubes,
Tem
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