Electrical characterization of GaN/ALN heterostructures grown by molecular beam epitaxy on silicon substrates



Título del documento: Electrical characterization of GaN/ALN heterostructures grown by molecular beam epitaxy on silicon substrates
Revista: Revista mexicana de física
Base de datos: PERIÓDICA
Número de sistema: 000450567
ISSN: 0035-001X
Autores: 1
2
2
3
3
4
Instituciones: 1Instituto Politécnico Nacional, Centro de Investigación en Ciencia Aplicada y Tecnología Avanzada, México, Distrito Federal. México
2Instituto Politécnico Nacional, Centro de Investigación y Estudios Avanzados, México, Distrito Federal. México
3Instituto Politécnico Nacional, Escuela Superior de Física y Matemáticas, México, Distrito Federal. México
4Universidad Nacional Autónoma de México,, Instituto de Investigaciones en Materiales, México, Distrito Federal. México
Año:
Periodo: Ene-Feb
Volumen: 62
Número: 1
Paginación: 68-72
País: México
Idioma: Inglés
Tipo de documento: Artículo
Enfoque: Analítico, teórico
Resumen en inglés In this paper, n-type gallium nitride thin films were grown on p-type and n-type silicon substrates by Molecular Beam Epitaxy technique, employing an aluminum nitride layer as an insulator buffer coating. The samples constitute primary semiconductor-insulator-semiconductor or SIS heterostructures, on which silver electrical contacts were deposited superficially by sputtering for electrical characterization purposes. The current intensity vs. voltage curves, charge carriers density, diffusion coefficient and mobility of charge carriers were determined in darkness conditions. Under AM1.5 homogenous illumination, the samples exhibited relatively large open-circuit voltage values, but low values for energy conversion efficiencies. Additionally, the dependency in photon energy of the open-circuit voltage was determined, in the range 1.77 eV to 4.13 eV, showing a minimum in the energy corresponding to the GaN energy band gap. Finally we discuss the prevailing charge transfer mechanism
Disciplinas: Física y astronomía
Palabras clave: Física,
Caracterización eléctrica,
Nitruro de galio,
Epitaxia de haz molecular,
Semiconductores
Keyword: Efecto Hall,
Physics,
Electrical characterization,
Gallium nitride,
Hall effect,
Molecular beam epitaxy,
Semiconductors
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