| Revista: | Materials research |
| Base de datos: | PERIÓDICA |
| Número de sistema: | 000312503 |
| ISSN: | 1516-1439 |
| Autores: | Senna, L.F1 Achete, C.A Simao, R.A Hirsch, T |
| Instituciones: | 1Universidade Federal do Rio de Janeiro, Rio de Janeiro. Brasil |
| Año: | 2001 |
| Volumen: | 4 |
| Número: | 2 |
| Paginación: | 137-141 |
| País: | Brasil |
| Idioma: | Inglés |
| Tipo de documento: | Artículo |
| Enfoque: | Experimental |
| Resumen en inglés | Hard thin TiN, TiCxNy and CrN films deposited by Physical Vapor Deposition (PVD) techniques onto steel substrates were immersed in an aggressive environment and evaluated by Atomic Force Microscopy (AFM) and Electrochemical Impedance Spectroscopy (EIS). The mechanical and electrochemical behavior, as well as the microstructure of TiCxNy depended directly on the contents of carbon and nitrogen in the coating. The best results were obtained with stoichiometric coatings that are presented in this work. Although a small amount of pinholes could be observed, the electrochemical performance of TiN film was poorer than the stoichiometric TiCxNy coating. However, the CrN films showed the highest initial and residual corrosion resistance values, probably due to their dense structure |
| Disciplinas: | Ingeniería |
| Palabras clave: | Ingeniería de materiales, Ingeniería química, Películas, Nitruro de titanio, Microscopía de fuerza atómica, Espectroscopía de impedancia electroquímica |
| Keyword: | Engineering, Chemical engineering, Materials engineering, Films, Titanium nitride, Atomic force microscopy, Electrochemical impedance spectroscopy |
| Texto completo: | Texto completo (Ver HTML) |
