Thickness dependence of the properties of indium tin oxide (ITO) FILMS prepared by activated reactive evaporation



Título del documento: Thickness dependence of the properties of indium tin oxide (ITO) FILMS prepared by activated reactive evaporation
Revista: Brazilian journal of physics
Base de datos: PERIÓDICA
Número de sistema: 000329388
ISSN: 0103-9733
Autores: 1
2
2
2
3
Instituciones: 1Mar Athanasius College of Engineering, Department of Physics, Kerala. India
2Maharaja College, Department of Physics, Kerala. India
3Cochin University of Science and Technology, Department of Physics, Kochi Kerala. India
Año:
Periodo: Dic
Volumen: 39
Número: 4
Paginación: 629-632
País: Brasil
Idioma: Inglés
Tipo de documento: Artículo
Enfoque: Experimental
Resumen en inglés Tin doped indium oxide thin films were prepared on glass substrates kept at room temperature, by activated reactive evaporation (ARE). Structural, electrical and optical properties were studied for films having different thickness. The resulting films are polycrystalline and show ≈ 90 % transmission in the visible region. Hall effect measurements at room temperature for a film with a nominal thickness of ≈ 350 nm shows a relatively high carrier concentration ≈ 6.3 × 1020 cm-3, mobility ≈ 16 cm2 V-1s-1, with a low resistivity ≈ 1.01×10-3W cm
Disciplinas: Física y astronomía
Palabras clave: Física,
Optica,
Teoría cinética y plasmas,
Películas delgadas,
Oxido de estaño indio,
Evaporación reactiva activada
Keyword: Physics and astronomy,
Kinetic theory and plasma,
Optics,
Physics,
Thin films,
Indium tin oxide,
Activated reactive evaporation
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