Revista: | Brazilian journal of physics |
Base de datos: | PERIÓDICA |
Número de sistema: | 000398314 |
ISSN: | 0103-9733 |
Autores: | De-hua Wang1 Yi-hao Wang1 Jian-wei Li1 |
Instituciones: | 1Ludong University, School of Physics and Optoelectronic Engineering, Yantai, Shandong. China |
Año: | 2013 |
Periodo: | Jun |
Volumen: | 43 |
Número: | 3 |
Paginación: | 121-125 |
País: | Brasil |
Idioma: | Inglés |
Tipo de documento: | Artículo |
Enfoque: | Analítico |
Resumen en inglés | We combine a simple model potential with closed-orbit theory to study the photodetachment of H− near a dielectric-covered metal surface. We calculate photodetachment cross sections to show that the chemisorption of a dielectric thin layer on the metal surface can significantly affect the photodetachment of negative ions. Compared to the photodetachment of hydrogen negative ions near clean metallic surfaces, our calculated cross sections show stronger oscillations, the amplitude of the oscillation growing with the layer thickness. For fixed thickness, the amplitude depends on the dielectric constant and on the metallic surface. We expect our study to guide future experimental studies of negativeion photodetachment from dielectric-covered metallic surfaces |
Disciplinas: | Física y astronomía, Ingeniería |
Palabras clave: | Física atómica y molecular, Física de materia condensada, Ingeniería de materiales, Superficies metálicas, Iones, Películas delgadas, Dieléctricos |
Keyword: | Physics and astronomy, Engineering, Atomic and molecular physics, Condensed matter physics, Materials engineering, Metallic surfaces, Ions, Thin films, Dielectrics |
Texto completo: | Texto completo (Ver PDF) |