Photodetachment of H− near a Dielectric-Covered Metal Surface



Título del documento: Photodetachment of H− near a Dielectric-Covered Metal Surface
Revista: Brazilian journal of physics
Base de datos: PERIÓDICA
Número de sistema: 000398314
ISSN: 0103-9733
Autores: 1
1
1
Instituciones: 1Ludong University, School of Physics and Optoelectronic Engineering, Yantai, Shandong. China
Año:
Periodo: Jun
Volumen: 43
Número: 3
Paginación: 121-125
País: Brasil
Idioma: Inglés
Tipo de documento: Artículo
Enfoque: Analítico
Resumen en inglés We combine a simple model potential with closed-orbit theory to study the photodetachment of H− near a dielectric-covered metal surface. We calculate photodetachment cross sections to show that the chemisorption of a dielectric thin layer on the metal surface can significantly affect the photodetachment of negative ions. Compared to the photodetachment of hydrogen negative ions near clean metallic surfaces, our calculated cross sections show stronger oscillations, the amplitude of the oscillation growing with the layer thickness. For fixed thickness, the amplitude depends on the dielectric constant and on the metallic surface. We expect our study to guide future experimental studies of negativeion photodetachment from dielectric-covered metallic surfaces
Disciplinas: Física y astronomía,
Ingeniería
Palabras clave: Física atómica y molecular,
Física de materia condensada,
Ingeniería de materiales,
Superficies metálicas,
Iones,
Películas delgadas,
Dieléctricos
Keyword: Physics and astronomy,
Engineering,
Atomic and molecular physics,
Condensed matter physics,
Materials engineering,
Metallic surfaces,
Ions,
Thin films,
Dielectrics
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