Revista: | Superficies y vacío |
Base de datos: | PERIÓDICA |
Número de sistema: | 000404880 |
ISSN: | 1665-3521 |
Autors: | Jergel, M1 Falcony, C1 Aguilar Frutis, M2 Auger, M.A3 Sanchez, O3 Albella, J.M3 |
Institucions: | 1Instituto Politécnico Nacional, Centro de Investigación y de Estudios Avanzados, México, Distrito Federal. México 2Instituto Politécnico Nacional, Centro de Investigación en Ciencia Aplicada y Tecnología Avanzada, México, Distrito Federal. México 3Consejo Superior de Investigaciones Científicas, Instituto de Ciencia de Materiales de Madrid, Madrid. España |
Any: | 2003 |
Període: | Mar |
Volum: | 16 |
Número: | 1 |
Paginació: | 22-27 |
País: | México |
Idioma: | Inglés |
Tipo de documento: | Artículo |
Enfoque: | Analítico |
Resumen en inglés | Highly stoichiometric hexagonal AlN films of different thicknesses ranging from »10 nm to >1 mm were synthetized on silicon (100) substrates under the same deposition conditions by dc reactive magnetron sputtering. The X-ray diffraction and reflectometry, ellipsometry, scanning electron and atomic force microscopies, and nanoindentation techniques were applied to study the effect of the film thickness on the structure, refractive index and hardness. Fine granular structure transforms into the ordered columnar form possessing (002) texture with increasing film thickness, the refractive index being affected only slightly. The most notable feature is the existence of a particular film thickness around 800 nm where the texture perfection reaches a maximum. This result was verified on a repeatedly deposited film of the same thickness. The texture extreme at 800 nm brings about a significant hardness enhancement which surpasses 20 GPa, presumably due to the hampered dislocation formation and/or motion |
Disciplines | Física y astronomía, Ingeniería |
Paraules clau: | Física de materia condensada, Ingeniería de materiales, Películas delgadas, Estado sólido, Nitruro de aluminio, Propiedades mecánicas, Dureza |
Keyword: | Physics and astronomy, Engineering, Condensed matter physics, Materials engineering, Thin films, Solid state, Aluminum nitride, Mechanical properties, Hardness |
Text complet: | Texto completo (Ver PDF) |