| Revista: | Superficies y vacío |
| Base de datos: | PERIÓDICA |
| Número de sistema: | 000404715 |
| ISSN: | 1665-3521 |
| Autors: | Martel, A1 Caballero Briones, F2 Castro Rodríguez, R3 Bartolo Pérez, P3 |
| Institucions: | 1Universidad Autónoma de Yucatán, Facultad de Ingeniería, Mérida, Yucatán. México 2Instituto Politécnico Nacional, Centro de Investigación en Ciencia Aplicada y Tecnología Avanzada, Altamira, Tamaulipas. México 3Instituto Politécnico Nacional, Centro de Investigación y de Estudios Avanzados, Mérida, Yucatán. México |
| Any: | 2004 |
| Període: | Dic |
| Volum: | 17 |
| Número: | 4 |
| Paginació: | 1-6 |
| País: | México |
| Idioma: | Inglés |
| Tipo de documento: | Artículo |
| Enfoque: | Analítico |
| Resumen en inglés | Tin oxide films were growth by DC sputtering in oxygen plasma in the constant current mode. Films were growth at different substrate temperatures, cathode currents and oxygen pressures, and they were characterized by x-ray diffraction and x-ray photoelectron spectroscopy. The cathode voltage was monitored during the growth. Uniform, transparent films were obtained, with composition ranging from SnO to SnO2. At 40-60 mTorr a change in the crystallographic orientation of the films is observed. From the deconvolution of the x-ray diffractograms the texture parameter and the phase composition of the films were obtained |
| Disciplines | Física y astronomía, Ingeniería |
| Paraules clau: | Física de materia condensada, Ingeniería de materiales, Películas delgadas, Dióxido de estaño, Pulverización catódica, Difracción de rayos X, Oxido de estaño |
| Keyword: | Physics and astronomy, Engineering, Condensed matter physics, Materials engineering, Thin films, Tin dioxide, Sputtering, X-ray diffraction, Tin oxide |
| Text complet: | Texto completo (Ver PDF) |
