Revista: | Revista mexicana de física |
Base de datos: | PERIÓDICA |
Número de sistema: | 000460760 |
ISSN: | 0035-001X |
Autores: | Dergham, D1 Ouchabane, M1 Hadjira, S2 Lekoui, F1 Hassani, S1 |
Instituciones: | 1Centre de Developpement des Technologies Avancees, Argel. Algérie 2Universite Saad Dahlab de Blida, Departement de Genie des Procedes, Blida. Argelia |
Año: | 2022 |
Periodo: | May-Jun |
Volumen: | 68 |
Número: | 3 |
País: | México |
Idioma: | Inglés |
Tipo de documento: | Artículo |
Enfoque: | Analítico, teórico |
Resumen en inglés | The proposed manuscript deals with packaging surface paper treatment with plasma enhanced chemical vapor deposition (PECVD) technique. To do this, paper samples were held on a grounded substrate to be in contact with methane(CH4) plasma created by the upper cathode to grow hydrogenated carbon films (a — C: H) on top surface of paper. The treatment duration was maintained for 5, 10, 15 and 20 min while pressure and power have been kept constant at 8 × 10-2 and 100 W, respectively. After deposition the surface sample has undergone structural and morphological characterization by Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM) and Fourier Transform Infrared Spectroscopy (FTIR) is performed to reveal the bonding structure. The surface wettability of the treated samples was evaluated by contact angle (CA) measurement. The results of CA show the change of surface paper from hydrophilic to hydrophobic and even superhydrophobic with a maximum contact angle equal 156° |
Disciplinas: | Física y astronomía |
Palabras clave: | Ciencias de los materiales, Superficie hidrófoba, Capas A-C:H, Deposición química, Sustratos de papel |
Keyword: | Materials sciences, Hydrophobic surface, A-C:H layers, Chemical deposition, Paper substrates |
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