Interface Morphology of Gen / Si Quantum Wells Studied with Raman Spectroscopy and High Resolution X-Ray Diffraction



Título del documento: Interface Morphology of Gen / Si Quantum Wells Studied with Raman Spectroscopy and High Resolution X-Ray Diffraction
Revista: Brazilian journal of physics
Base de datos: PERIÓDICA
Número de sistema: 000309113
ISSN: 0103-9733
Autors: 1


2
Institucions: 1Universidade Estadual de Campinas, Instituto de Fisica "Gleb Wataghin", Campinas, Sao Paulo. Brasil
2University of Virginia, Department of Materials Science and Engineering, Charlottesville, Virginia. Estados Unidos de América
Any:
Període: Dic
Volum: 27
Número: 4
Paginació: 632-637
País: Brasil
Idioma: Inglés
Tipo de documento: Artículo
Enfoque: Experimental, aplicado
Resumen en inglés We report Raman scattering and high-resolution X-ray diffraction measurements performed on a series of MBE-grown Si / Gen / Si quantum wells with n varying from 3 to 6. Our results are consistent with a gradual evolution of the Si / Ge interface which starts with Ge segregation and formation of terraces for low Ge coverage, to smooth 2D Ge layers, bounded by interfacial alloy layers, for coverages superior to 4M Ls
Disciplines Física y astronomía
Paraules clau: Física de partículas y campos cuánticos,
Pozos cuánticos,
Dispersión,
Espectroscopía Raman,
Difracción de rayos X
Keyword: Physics and astronomy,
Particle physics and quantum fields,
Quantum wells,
Scattering,
Raman spectroscopy,
X-ray diffraction
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