Impurity breakdown in GaAs samples grown by molecular beam epitaxy



Título del documento: Impurity breakdown in GaAs samples grown by molecular beam epitaxy
Revista: Brazilian journal of physics
Base de datos: PERIÓDICA
Número de sistema: 000159287
ISSN: 0103-9733
Autors: 1





Institucions: 1Universidade Federal de Minas Gerais, Departamento de Física, Belo Horizonte, Minas Gerais. Brasil
Any:
Període: Dic
Volum: 29
Número: 4
Paginació: 793-796
País: Brasil
Idioma: Inglés
Tipo de documento: Artículo
Enfoque: Analítico
Resumen en inglés In this work we present studies for the behavior of impurity breakdown of two GaAs samples grown by Molecular Beam Epitaxy at 200°C and 300°C. We vary the temperature and the illumination intensity. For the sample grown at 200°C, the transport mechanism after the breakdown is of the same type of the main free carriers at low electric fields. Below 100K, a clear dependence of the threshold electric field with temperature was observed. The sample grown at 300°C shows a breakdown due to an acceptor level at 41meV from the valence band. The threshold electric field increases with illumination due to the generation of free electrons by deep levels. A similar behavior was also observed for a Cr doped GaAs sample
Disciplines Física y astronomía
Paraules clau: Física de materia condensada,
Semiconductores,
Conductividad,
Impurezas,
Epitaxia
Keyword: Physics and astronomy,
Condensed matter physics,
Semiconductors,
Conductivity,
Impurities,
Epitaxy
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