GaN nanowires and nanotubes growth by chemical vapor deposition method at different NH3 flow rate



Document title: GaN nanowires and nanotubes growth by chemical vapor deposition method at different NH3 flow rate
Journal: Revista mexicana de física
Database: PERIÓDICA
System number: 000404276
ISSN: 0035-001X
Authors: 1
1
1
Institutions: 1Wuhan University, School of Physics and Technology, Wuhan, Hubei. China
Year:
Season: May-Jun
Volumen: 62
Number: 3
Pages: 219-222
Country: México
Language: Inglés
Document type: Artículo
Approach: Analítico, teórico
English abstract GaN nanowires and nanotubes have been successfully synthesized via the simple chemical vapor deposition method. NH3 flow rate was found to be a crucial factor in the synthesis of different type of GaN which affects the shape and the diameter of generated GaN nanostructures. X-ray diffraction confirms that GaN nanowires grown on Si(111) substrate under 900◦C and with NH3 flow rate of 50 sccm presents the preferred orientation growth in the (002) direction. It is beneficial to the growth of nanostructure through catalyst annealing. Transmission electron microscopy and scanning electron microscopy were used to measure the size and structures of the samples
Disciplines: Física y astronomía,
Ingeniería
Keyword: Física de materia condensada,
Ingeniería de materiales,
GaN,
CVD,
Nanotubos,
Tem
Keyword: Physics and astronomy,
Engineering,
Condensed matter physics,
Materials engineering,
GaN,
CVD,
Nanotubes,
Tem
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